A localized ELF magnetic field exposure system for microscope cover-slips.
In extremely low frequency (ELF) magnetic field exposure systems for the inverted microscope stage where the cells grown on the entire microscope cover-slip are exposed to the magnetic field, the effects of variations in cell characteristics from one cover-slip to another on the experimental data cannot be readily identified. To overcome this drawback, a localized ELF magnetic field exposure system for cells grown on cover-slips was designed. The basic idea is to expose only a marked portion of the cover-slip to the magnetic field so that the effect of the ELF magnetic field on the cells grown on the same cover-slip can be observed under a microscope. A prototype system was built and tested. Experimental test results pertaining to the prototype system performance validate the proposed design approach. The paper concludes with a discussion of alternative approaches to the design of localized ELF magnetic field exposure systems.
['Wang|Paul K C|PK|']
D049109:Cell Proliferation D004867:Equipment Design D060526:Magnetic Fields D008853:Microscopy
ELF magnetic field exposure systems localized magnetic field