The structure and phase composition of the coating system TiB<sub>2</sub>-Cu by means electrical explosive treatment
The methods of profilometry, optical microscopy study topography and features of the structure of coating electrical copper samples after treatment of multiphase plasma jets products of electrical explosion. It is established that the parameter of surface roughness after processing Ra = 2,0…2,1 pm. It is shown that a single pulse processing method capable of applying porous coating thickness 53... 60 microns. With three times the thickness of the coating process is 230 microns without the boundaries between individual layers successively inflicted. The phase composition of formed layers of titanium diboride TiB2 forms and copper. The coatings have a cohesive-adhesive bond with the material contact surface.